I-evaporation coating: Ngokufudumeza kunye nokufaka umphunga into ethile ukuze uyifake kumphezulu oqinileyo, ibizwa ngokuba yi-evaporation coating.Le ndlela yaqala ecetywayo ngu M. Faraday ngo 1857, kwaye iye yaba yenye
iindlela zokugquma ezixhaphakileyo kumaxesha anamhlanje.Ubume bezixhobo zokugquma i-evaporation buboniswe kuMfanekiso 1.
Izinto ezikhutshwa ngumphunga ezifana nesinyithi, iikhompawundi, njl.njl. zibekwe kwi-crucible okanye zixhonywe kucingo olushushu njengomthombo womoya, kunye nomsebenzi oza kucandwa, njengentsimbi, i-ceramic, iplastiki kunye nezinye ii-substrates, ibekwe phambi i-crucible.Emva kokuba inkqubo ikhutshwe kwi-vacuum ephezulu, i-crucible ishushu ukuze ikhuphe iziqulatho.Ii-athomu okanye iiathomu zento engumphunga zifakwe kumphezulu we-substrate ngendlela ecuthiweyo.Ubunzima befilimu bunokuvela kumakhulu ama-angstroms ukuya kwii-microns ezininzi.Ubunzima befilimu buchongwa ngumlinganiselo wokuphuma kwamanzi kunye nexesha lomthombo wokufudumala (okanye ubungakanani bokulayisha), kwaye uhambelana nomgama phakathi komthombo kunye ne-substrate.Kwiindawo zokugquma iindawo ezinkulu, i-substrate ejikelezayo okanye imithombo ye-evaporation eninzi ihlala isetyenziselwa ukuqinisekisa ukufana kobunzima befilimu.Umgama osuka kumthombo womphunga ukuya kwi-substrate kufuneka ube ngaphantsi kwendlela ekhululekileyo yeemolekyuli zomphunga kwirhasi eshiyekileyo ukuthintela ukungqubana kweeathom zomphunga ezineemolekyuli zerhasi ezishiyekileyo ekubeni zibangele iziphumo zekhemikhali.I-avareji amandla kinetic iimolekyuli zomphunga malunga 0.1 ukuba 0.2 electron volts.
Zintathu iindidi zemithombo yobushushu.
① Umthombo wokufudumeza oxhathisayo: Sebenzisa iintsimbi ezilahlayo ezifana ne-tungsten kunye ne-tantalum ukwenza i-foil yesikhephe okanye i-filament, kwaye usebenzise umbane wangoku ukufudumeza into engumphunga ngaphezu kwayo okanye kwi-crucible (Umfanekiso 1 [umzobo we-Schematic wesixhobo sokugquma umphunga] i-vacuum coating) Ukumelana nokufudumeza umthombo usetyenziswa ikakhulu ukukhupha izinto ezifana neCd, Pb, Ag, Al, Cu, Cr, Au, Ni;
②Umthombo wokufudumeza we-high-frequency induction: sebenzisa i-high-frequency induction current ukutshisa i-crucible kunye ne-evaporation material;
③Umthombo wokufudumeza we-Electron: esebenzayo Kwimathiriyeli ezinobushushu obuphezulu bokuguquka (bungekho ngaphantsi kwe-2000 [618-1]), imathiriyeli yenziwa ngumphunga ngokubhombuza imathiriyeli ngemiqadi ye-electron.
Xa kuthelekiswa nezinye iindlela zokugquma kwevacuum, i-evaporative coating inezinga eliphezulu lokubeka, kwaye inokugqunywa ngeefilimu zekhompawundi ezisisiseko nezingaboli.
Ukuze ufake ifilimu ye-crystal eyodwa ecocekileyo, i-molecular beam epitaxy ingasetyenziswa.Isixhobo se-molecular beam epitaxy sokukhulisa i-doped GaAlAs umaleko wekristale enye iboniswe kuMzobo 2 [umzobo weSchematic we-molecular beam epitaxy device vacuum coating].I-jet furnace ixhotyiswe ngomthombo we-molecular beam.Xa ifudunyezwa kubushushu obuthile phantsi kwe-vacuum ephezulu kakhulu, izinto ezikwiziko zikhutshelwa kwi-substrate kumsinga onjenge-molecular stream.I-substrate ifudumala kwiqondo lokushisa elithile, iimolekyuli ezifakwe kwi-substrate zinokufuduka, kwaye iikristale zikhulile ngokulandelelana kwe-crystal lattice.I-molecular beam epitaxy ingasetyenziselwa
fumana ifilimu ye-crystal ecocekileyo ephezulu kunye ne-stoichiometric ratio efunekayo.Ifilimu ikhula ngokucotha kakhulu Isantya sinokulawulwa kwi-1 enye umaleko / umzuzwana.Ngokulawula i-baffle, ifilimu ye-crystal eyodwa kunye nokwakheka okufunekayo kunye nesakhiwo sinokwenziwa ngokuchanekileyo.I-epitaxy ye-molecular beam isetyenziswa ngokubanzi ukwenza izixhobo ezahlukeneyo ezidityanisiweyo ze-optical kunye neefilimu ezahlukeneyo zesakhiwo se-superlattice.
Ixesha lokuposa: Jul-31-2021